Sputtering target Titanium 99.7 – WINNERS


  • linkend
  • twitter
  • YouTube2
  • Facebook1
  • WhatsApp2

Product Detail

Product Tags

Related Video

Feedback (2)

Innovation, good quality and reliability are the core values of our enterprise. These principles today extra than ever form the basis of our success as an internationally active mid-size organization for wolfram alloy, Crucibles And E-Beam Liner, Bright Molybdenum Crucibles For Sapphire Growing Furnace, We sincerely welcome both equally international and domestic company associates, and hope to work along with you during the in close proximity to foreseeable future!
Sputtering target Titanium 99.7 – WINNERS Detail:

Product Description

How Does Magnetron Sputtering Work?
Magnetron sputtering is a physical vapour deposition (PVD) method, a class of vacuum deposition processes for producing thin films and coatings.
The name “magnetron sputtering” arises from the use of magnetic fields to control the charged ion particles’ behaviour in the magnetron sputter deposition process. The process requires a high vacuum chamber to create a low-pressure environment for sputtering. The gas that comprises the plasma, typically argon gas, enters the chamber first.
A high negative voltage is applied between the cathode and the anode to initiate the ionisation of the inert gas. Positive argon ions from the plasma collide with the negatively charged target material. Each collision of high energy particles can cause atoms from the target surface to eject into the vacuum environment and propel onto the surface of the substrate.

How Does Magnetron Sputtering Work

A strong magnetic field produces high plasma density by confining the electrons near the target surface, increasing the rate of deposition and preventing damage to the substrate from ion bombardment. Most materials can act as a target for the sputtering process since the magnetron sputtering system does not require melting or evaporation of the source material.

Product Parameters

Products name Pure titanium target
Grade Gr1
Purity More 99.7%
Density 4.5g/cm3
MOQ 5 pieces
Hot sale size Φ95*40mm
Φ98*45mm
Φ100*40mm
Φ128*45mm
Application Coating for PVD machine
Stock size Φ98*45mm
Φ100*40mm
Other available Targets Molybdenum(Mo)
Chrome(Cr)
TiAl
Copper(Cu)
Zirconium(Zr)

Application

● Coating integrated circuits.
● Surface panel displays of flat panels and other components.
● Decoration and glass coating, etc.

Order Information

Inquiries and orders should include the following information
● Diameter, Height(such like Φ100*40mm).
● Thread size (Such like M90*2mm).
● Quantity.
● Purity demand.


Product detail pictures:

Sputtering target Titanium 99.7 – WINNERS detail pictures

Sputtering target Titanium 99.7 – WINNERS detail pictures

Sputtering target Titanium 99.7 – WINNERS detail pictures

Sputtering target Titanium 99.7 – WINNERS detail pictures

Sputtering target Titanium 99.7 – WINNERS detail pictures


Related Product Guide:

We have been proud from the higher consumer gratification and wide acceptance due to our persistent pursuit of high quality both on product or service and service for Sputtering target Titanium 99.7 – WINNERS , The product will supply to all over the world, such as: London, Stuttgart, Cambodia, Adhering to the management tenet of "Managing Sincerely, Winning by Quality", we try our best to provide excellent products and service to our clients. We look forward to making progress together with domestic and international clients.
  • This supplier offers high quality but low price products, it is really a nice manufacturer and business partner.
    5 Stars By Michaelia from Kyrgyzstan - 2017.10.13 10:47
    Problems can be quickly and effectively resolved, it is worth to be trust and working together.
    5 Stars By Alma from Canberra - 2017.08.18 11:04
    Write your message here and send it to us