Pure Planar titanium target
Product Description
Sputtering is one of the main techniques for preparing thin film materials. It uses ions generated by ion sources to accelerate and aggregate in a vacuum to form high-speed energy ion beams, bombard the solid surface and exchange kinetic energy between ions and solid surface atoms. The atoms on the solid surface leave the solid and are deposited on the surface of the substrate. The bombarded solid is the raw material for preparing the thin film deposited by the sputtering method, which is called the sputtering target.
Note: We can produce and process various metal targets, and can customize various specifications. Please consult us for details.
▎Product Parameters
| Products name | Planar target material |
| Shape | Square target, Round Target |
| Hot sale size | Rod target Φ100*40mm, Φ95*40mm，Φ98*45mm，Φ80*35mm |
| Square target 3mm, 5mm, 8mm, 12mm |
|
| MOQ | 3 pieces |
| Material | Ti, Cr, Zr, W, Mo, Ta,Ni |
| Production Process | Molten casting method, powder metallurgy method |
▎Application
Magnetron sputtering coating is a new type of physical vapor coating method. Compared with the evaporation coating method, it has obvious advantages in many aspects. Metal sputtering targets have been used in many fields. The main application of flat target.
● Decoration industry
● Architectural glass
● Auto glass
● Low-E glass
● Flat panel display
● Optical industry
● Optical data storage industry, etc
▎Order Information
Inquiries and orders should include the following information:
● Target material.
● The shape of the target material, according to the shape, provides specifications or provide samples and drawings.
● Please provide thread specifications for targets that need threaded connection, such as: M90*2 (thread major diameter * thread pitch).
Please contact us for other special needs.
