OEM/ODM China Refractory Metal Heating Elements - Metal rotary target – WINNERS
OEM/ODM China Refractory Metal Heating Elements - Metal rotary target – WINNERS Detail:
Product Description
An orthogonal magnetic field and electric field are added between the sputtered target (cathode) and the anode, and the required inert gas
(usually Ar gas)is filled in the high vacuum chamber.Under the action of the electric field, the Ar gas is ionized into positive ions And electrons,
a certain negative high pressure is applied to the target , the electrons emitted from the target are affected by the magnetic field and the
ionization probability of the working gas increases , forming a high-density plasma near the cathode , and Ar ions are under the action of
Lorentz force . Accelerate to fly to the target surface , bombard the target surface at a high speed, so that the sputtered atoms on the target
follow the momentum conversion principle and fly away from the target surface to the substrate to deposit a film with high kinetic energy.
In order to further improve the utilization rate of the target material, a rotating cathode with higher use efficiency is designed, and a tubular
target material is used for sputtering coating. The improvement of sputtering equipment requires the target to be changed from a flat shape
to a tubular shape , and the utilization rate of the tubular rotating target can be as high as 70% , which largely solves the problem of low
utilization of the flat target.
Product Parameters
Products name | Metal rotary target |
Material | W, Mo, Ta, Ni, Ti, Zr, Cr, TiAl |
Hot sale size | ID-133/ OD-157x 3191mm ID-133/OD-157 X 3855mm ID-160/OD-180x1800mm Can also be processed according to the specific requirements of customers |
MOQ | 3 pieces |
Package | Ply wooden case |
Note: We mainly produce various metal targets, please consult us for details.
Application
Sputtering coating is a new type of physical vapor coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. Metal sputtering targets have been used in many fields. The main application of rotating target.
● Solar cells
● Architectural glass
● Auto glass
● Semiconductor
● Flat-screen TV, etc
Order Information
Inquiries and orders should include the following information ● Target specification ID*OD*L (mm). ● Quantity required. ● Please contact us for other special needs.
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