2022 Latest Design Metal Diaphragm - Sputtering target Titanium 99.7 – WINNERS


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abide by the contract", conforms to the market requirement, joins in the market competition by its high quality as well as provides more comprehensive and excellent service for clients to let them become big winner. The pursue of the company, is the clients' satisfaction for Mo Metal Rod, Tungsten Rod For Aluminum, Ultra-Thin Tungsten Tube, Accurate process devices, Advanced Injection Molding Equipment, Equipment assembly line, labs and software advancement are our distinguishing feature.
2022 Latest Design Metal Diaphragm - Sputtering target Titanium 99.7 – WINNERS Detail:

Product Description

How Does Magnetron Sputtering Work?
Magnetron sputtering is a physical vapour deposition (PVD) method, a class of vacuum deposition processes for producing thin films and coatings.
The name “magnetron sputtering” arises from the use of magnetic fields to control the charged ion particles’ behaviour in the magnetron sputter deposition process. The process requires a high vacuum chamber to create a low-pressure environment for sputtering. The gas that comprises the plasma, typically argon gas, enters the chamber first.
A high negative voltage is applied between the cathode and the anode to initiate the ionisation of the inert gas. Positive argon ions from the plasma collide with the negatively charged target material. Each collision of high energy particles can cause atoms from the target surface to eject into the vacuum environment and propel onto the surface of the substrate.

How Does Magnetron Sputtering Work

A strong magnetic field produces high plasma density by confining the electrons near the target surface, increasing the rate of deposition and preventing damage to the substrate from ion bombardment. Most materials can act as a target for the sputtering process since the magnetron sputtering system does not require melting or evaporation of the source material.

Product Parameters

Products name Pure titanium target
Grade Gr1
Purity More 99.7%
Density 4.5g/cm3
MOQ 5 pieces
Hot sale size Φ95*40mm
Φ98*45mm
Φ100*40mm
Φ128*45mm
Application Coating for PVD machine
Stock size Φ98*45mm
Φ100*40mm
Other available Targets Molybdenum(Mo)
Chrome(Cr)
TiAl
Copper(Cu)
Zirconium(Zr)

Application

● Coating integrated circuits.
● Surface panel displays of flat panels and other components.
● Decoration and glass coating, etc.

Order Information

Inquiries and orders should include the following information
● Diameter, Height(such like Φ100*40mm).
● Thread size (Such like M90*2mm).
● Quantity.
● Purity demand.


Product detail pictures:

2022 Latest Design Metal Diaphragm - Sputtering target Titanium 99.7 – WINNERS detail pictures

2022 Latest Design Metal Diaphragm - Sputtering target Titanium 99.7 – WINNERS detail pictures

2022 Latest Design Metal Diaphragm - Sputtering target Titanium 99.7 – WINNERS detail pictures

2022 Latest Design Metal Diaphragm - Sputtering target Titanium 99.7 – WINNERS detail pictures

2022 Latest Design Metal Diaphragm - Sputtering target Titanium 99.7 – WINNERS detail pictures


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  • This is a very professional and honest Chinese supplier, from now on we fell in love with the Chinese manufacturing.
    5 Stars By Karen from Ecuador - 2017.11.12 12:31
    We are a small company that has just started, but we get the company leader's attention and gave us a lot of help. Hope we can make progress together!
    5 Stars By Cara from Finland - 2018.04.25 16:46
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